SURFACES MAGNETRON SPUTTERING REDUCES SCALE FORMATION UNDER FLOW BOILING
在流动沸腾装置中磁控溅射表面的抗垢性能
Electromagnetic Shielding Fabrics with Magnetron Sputtered Copper Coating
磁控溅射法制备电磁屏蔽织物的研究
Crystal Growth of ZnS Thin Film on Si Substrate by RF Magnetron Sputtering
硅基硫化锌薄膜的溅射法生长技术
In this paper, we study the magnetron cavity used in atomic hydrogen maser.
本文对磁控管腔进行了试验研究。
New technology for antitarnish of silver film gained by magnetron sputtering.
防磁控溅射镀银膜变色新工艺
The FM system is used for changing the oscillating frequency of the magnetron.
调频机构用来改变磁控管得振荡频率。
Boron carbon nitride thin films were deposited by radio frequency magnetron sputtering.
采用射频磁控溅射技术制备出硼碳氮薄膜。
Quantitative Analysis of Reliability and Allotment For Spare Parts of Missile Magnetron.
导弹磁控管可靠性的定量分析与备件配置
They paid special attention to raising the quality of magnetron and multicavity klystron.
他们特别注意提高磁控管和多腔速调管的质量。
A novel method to drive magnetron by constant voltageconstant current technique is proposed.
提出了用恒压恒流技术驱动磁控管得新方法。
Effects of Deposition Pressure on Nanocrystalline Silicon Thin Film by Magnetron Sputtering.
沉积压力对磁控溅射纳米硅薄膜结构和性能影响
In recent years, the relativistic magnetron with diffraction output has been studied rapidly.
最近几年, 轴向输出相对论磁控管得到了较多的研究。
The result of research showed that the aC F film was amorphous structure by magnetron sputtering.
研究结果表明, 磁控溅射制备的碳氟膜为非晶结构。
A new rotating cylindric magnetron sputtering is presented and successfully pro duced by ourselves.
提出并研制成功了一种新型旋转圆柱形磁控溅射器。
Magnetron it is characterized by small weight and a low level of the shf radiation from a cathodic leg.
其特点在于小的重量和低的阴极超高频辐射。
The development, principle and applications of magnetron sputtering technique are introduced in this paper.
该文介绍了磁控溅射沉积技术的基本原理、发展及应用。
Characteristic Comparison of Coating Metal on Cenospheres by Chemical Method and Magnetron Sputtering Method
空心微珠表面磁控溅射和化学镀金属膜的特性比较
The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
APPLICATION OF MULTIPLE PLASMA ARC DISCHARGE VACUUM MAGNETRON SPUTTERING COATING PLANT IN CERAMIC SURFACE DECORATION
磁控等离子多弧真空溅射镀膜机在陶瓷表面装饰的应用
Effect of Pulse Bias Voltage on Adhesive Strength of Magnetron Sputtering Ion Plated Al Coating on Depleted Uranium Surface
脉冲偏压对贫铀表面磁控溅射离子镀铝结合强度的影响
STUDY OF DISCHARGE PARAMETERS ON APPLIED PROPERTIES OF FLUOROCARBON COATINGS DEPOSITED ON PET FABRICS BY MAGNETRON SPUTTERING
磁控溅射法制备防水透湿织物
The invention provides a rectangular target with high target utilization ratio, which is used for magnetron sputtering metal films.
一种高靶材利用率的矩形靶，用于磁控溅射金属镀膜。
Some examples of measurement results for vacuum interrupters are presented by means of the coaxial field and pulsed magnetron discharges.
最后本文绘出了若干真空灭弧室真空度的测量实例。
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