With the Yankees' offense coming off a sputtering effort, Jeter's bat was a welcome presence.
当洋基的先发打线熄火，队长的棒子归队将是利多。
SPUTTERING YIELD CALCULATION BY MONTE CARLO SIMULATION WITH SCREENING LENGTH OF SHELL EFFECTS
方法计算溅射产额
The result of research showed that the aC F film was amorphous structure by magnetron sputtering.
研究结果表明, 磁控溅射制备的碳氟膜为非晶结构。
A new rotating cylindric magnetron sputtering is presented and successfully pro duced by ourselves.
提出并研制成功了一种新型旋转圆柱形磁控溅射器。
The sputtering yield per cluster ion is higher than that for monomer ion by a factor of more than 98.
离化团束得溅射产额比之单体离子束高100倍以上。
The sputtering yield per cluster ion is higher than that for monomer ion by a factor of more than 100.
离化团束的溅射产额比之单体离子束高100倍以上。
The development, principle and applications of magnetron sputtering technique are introduced in this paper.
该文介绍了磁控溅射沉积技术的基本原理、发展及应用。
The sputtering and sputtering attenuation also promoted the generation of this inner peak of concentration.
离子轰击得溅射作用和溅射衰减也促使出现内层峰。
Characteristic Comparison of Coating Metal on Cenospheres by Chemical Method and Magnetron Sputtering Method
空心微珠表面磁控溅射和化学镀金属膜的特性比较
The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
Being placed outside ion beam, the neutralization cathode filament can prevent direct sputtering from ion beam.
中和阴极灯丝置于离子束外可避免离子束的直接溅射
APPLICATION OF MULTIPLE PLASMA ARC DISCHARGE VACUUM MAGNETRON SPUTTERING COATING PLANT IN CERAMIC SURFACE DECORATION
磁控等离子多弧真空溅射镀膜机在陶瓷表面装饰的应用
Within a certain sputtering time, the inhibition rates had slight decline along with the sputtering power increased.
在一定膜厚下, 随溅射功率的增大, 抗菌性能略有下降。
Effect of Pulse Bias Voltage on Adhesive Strength of Magnetron Sputtering Ion Plated Al Coating on Depleted Uranium Surface
脉冲偏压对贫铀表面磁控溅射离子镀铝结合强度的影响
STUDY OF DISCHARGE PARAMETERS ON APPLIED PROPERTIES OF FLUOROCARBON COATINGS DEPOSITED ON PET FABRICS BY MAGNETRON SPUTTERING
磁控溅射法制备防水透湿织物
The invention provides a rectangular target with high target utilization ratio, which is used for magnetron sputtering metal films.
一种高靶材利用率的矩形靶，用于磁控溅射金属镀膜。
The review ofour work includes ion implanted contact, ion beam sputtering diposition hardfilm on beryllium and lubricate film on steel and so on.
即离子注入, 子束混合, 种离子束淀积等技术的研究和应用。
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