Rate Model of Focused Ion Beam Induced Deposition.
聚焦离子束辅助淀积的淀积速率模型
In this paper, Focused Ion Beam Lithography technology and is introduced.
对聚焦离子束曝光技术作了介绍。
ETCHING AND NANOCRYSTAL FORMING TECHNOLOGY DEVELOPMENT AT SAME POSITING USING FOCUSED ION BEAM
使用聚焦离子束在同一位置蚀刻及纳米晶体成形技术发展
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